Nitric acid 69% VLSI for microelectronic, J.T.Baker®
Supplier: Avantor
|
Danger
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5371-03EA
0
EUR
5371-03
Nitric acid 69% VLSI for microelectronic, J.T.Baker®
Nitric acid
Formula:
HNO₃ MW: 63,01 g/mol Density: 1,4 g/cm³ (20 °C) Storage Temperature: Ambient |
MDL Number:
MFCD00011349 UN: 2031 ADR: 8,II |
Specification Test Results
For Microelectronic Use | |
Assay (HNO₃) | 69.0 - 70.0 % |
Appearance | Passes Test |
Color (APHA) | ≤10 |
Chloride (Cl) | ≤0.08 ppm |
Phosphate (PO₄) | ≤0.05 ppm |
Sulfate (SO₄) | ≤0.2 ppm |
Trace Impurities - Aluminum (Al) | ≤20 ppb |
Arsenic and Antimony (as As) | ≤3.0 ppb |
Trace Impurities - Barium (Ba) | ≤10.0 ppb |
Trace Impurities - Bismuth (Bi) | ≤50 ppb |
Trace Impurities - Boron (B) | ≤10.0 ppb |
Trace Impurities - Cadmium (Cd) | ≤5.0 ppb |
Trace Impurities - Calcium (Ca) | ≤50.0 ppb |
Trace Impurities - Chromium (Cr) | ≤30.0 ppb |
Trace Impurities - Cobalt (Co) | ≤5.0 ppb |
Trace Impurities - Copper (Cu) | ≤5.0 ppb |
Trace Impurities - Gallium (Ga) | ≤10.0 ppb |
Trace Impurities - Germanium (Ge) | ≤10.0 ppb |
Trace Impurities - Gold (Au) | ≤10.0 ppb |
Trace Impurities - Iron (Fe) | ≤50.0 ppb |
Trace Impurities - Lead (Pb) | ≤20.0 ppb |
Trace Impurities - Lithium (Li) | ≤10.0 ppb |
Trace Impurities - Magnesium (Mg) | ≤30.0 ppb |
Trace Impurities - Manganese (Mn) | ≤5.0 ppb |
Trace Impurities - Nickel (Ni) | ≤10.0 ppb |
Trace Impurities - Niobium (Nb) | ≤50.0 ppb |
Trace Impurities - Potassium (K) | ≤20.0 ppb |
Trace Impurities - Silicon (Si) | ≤60.0 ppb |
Trace Impurities - Silver (Ag) | ≤10.0 ppb |
Trace Impurities - Sodium (Na) | ≤60.0 ppb |
Trace Impurities - Strontium (Sr) | ≤10.0 ppb |
Trace Impurities - Tin (Sn) | ≤10.0 ppb |
Trace Impurities - Titanium (Ti) | ≤50.0 ppb |
Trace Impurities - Zinc (Zn) | ≤10.0 ppb |
Particle Count - 0.5 µm and greater | ≤90 par/ml |
Particle Count - 1.0 µm and greater | ≤10 par/ml |
Reported value is the average of all samples counted for this lot number,with no individual sample value exceeding the specification. |
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