Sulphuric acid ≥95%, Finyte® for microelectronic, J.T.Baker®
Supplier: Avantor
5859-07EA
1570
EUR
5859-07
5859-TR
Sulphuric acid ≥95%, Finyte® for microelectronic, J.T.Baker®
Sulphuric acid
Formula:
H₂SO₄ MW: 98,08 g/mol |
MDL Number:
MFCD00064589 UN: 1830 ADR: 8,II |
Specification Test Results
For Microelectronic Use | |
Recommended Storage Conditions: 15° - 100°F | |
Assay (H₂SO₄) | 95.0 - 97.0 % |
Color (APHA) | ≤10 |
Chloride (Cl) | ≤0.1 ppm |
Nitrate (NO₃) | ≤0.1 ppm |
Phosphate (PO₄) | ≤0.20 ppm |
Trace Impurities - Aluminum (Al) | ≤10.0 ppb |
Arsenic and Antimony (as As) | ≤2.0 ppb |
Trace Impurities - Barium (Ba) | ≤5.0 ppb |
Trace Impurities - Beryllium (Be) | ≤1.0 ppb |
Trace Impurities - Bismuth (Bi) | ≤10.0 ppb |
Trace Impurities - Boron (B) | ≤10.0 ppb |
Trace Impurities - Cadmium (Cd) | ≤5.0 ppb |
Trace Impurities - Calcium (Ca) | ≤10.0 ppb |
Trace Impurities - Chromium (Cr) | ≤5.0 ppb |
Trace Impurities - Cobalt (Co) | ≤5.0 ppb |
Trace Impurities - Copper (Cu) | ≤5.0 ppb |
Trace Impurities - Gallium (Ga) | ≤10.0 ppb |
Trace Impurities - Germanium (Ge) | ≤10.0 ppb |
Trace Impurities - Gold (Au) | ≤5.0 ppb |
Trace Impurities - Iron (Fe) | ≤10.0 ppb |
Trace Impurities - Lead (Pb) | ≤10.0 ppb |
Trace Impurities - Lithium (Li) | ≤5.0 ppb |
Trace Impurities - Magnesium (Mg) | ≤10.0 ppb |
Trace Impurities - Manganese (Mn) | ≤5.0 ppb |
Trace Impurities - Molybdenum (Mo) | ≤5.0 ppb |
Trace Impurities - Nickel (Ni) | ≤5.0 ppb |
Trace Impurities - Niobium (Nb) | ≤5.0 ppb |
Trace Impurities - Potassium (K) | ≤10.0 ppb |
Trace Impurities - Silicon (Si) | ≤10.0 ppb |
Trace Impurities - Silver (Ag) | ≤5.0 ppb |
Trace Impurities - Sodium (Na) | ≤10.0 ppb |
Trace Impurities - Strontium (Sr) | ≤5.0 ppb |
Trace Impurities - Tantalum (Ta) | ≤10.0 ppb |
Trace Impurities - Thallium (Tl) | ≤10.0 ppb |
Trace Impurities - Tin (Sn) | ≤10.0 ppb |
Trace Impurities - Titanium (Ti) | ≤5.0 ppb |
Trace Impurities - Vanadium (V) | ≤5.0 ppb |
Trace Impurities - Zinc (Zn) | ≤10.0 ppb |
Trace Impurities - Zirconium (Zr) | ≤10.0 ppb |
Particle Count at point of fill - 0.2 µm and greater | ≤2000 par/ml |
Particle Count at point of fill - 0.5 µm and greater | ≤150 par/ml |
Particle Count at point of fill - 1.0 µm and greater | ≤25 par/ml |
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